Cov lus qhia tshwj xeeb ntawm Hafnium Tetrachloride 丨 13499-05-3
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Zog: |
Dawb lossis Lub Teeb Granular |
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Assay wt%: |
99.9% min |
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HF: |
55.728–57.2 |
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AL: |
{{0 {}}. 0010% Max |
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CA: |
0. 0015% Max |
|
CU: |
{{0 {}}. 0010% Max |
|
: |
{{0 {}}. 0020% Max |
|
Mg: |
{{0 {}}. 0010% Max |
|
Mn: |
{{0 {}}. 0010% Max |
|
Mo: |
{{0 {}}. 0010% Max |
|
NB: |
0. 01% Max |
|
Ni: |
{{0 {}}. 003% Max |
|
Si: |
0. 005% Max |
|
TI: |
0. 001% Max |
|
V: |
0. 001% Max |
|
ZN: |
0. 001% Max |
|
ZR: |
{{0 {}}. 02% Max |
Cov ntaub ntawv thauj ntawm Hafnium Tetrachloride 丨 13499-05-3
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Chaw ua uas tsis tau haus |
Kev qhia tshwj xeeb |
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UN NUM |
3260 |
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Hom |
8 |
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Cov Pab Pawg |
' |
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Hs code |
8112490000999 |
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Ruaj khov & rov ua |
Vaum Rhiab |
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Chaw ntim khoom |
Tsis txhob siv hlau ntim. Rhiab rau cov av noo |
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Mob kom tsis txhob |
Vaum Rhiab |
|
Lub thawv |
Lub ntsiab
Hafnium Tetrachloride 丨 {13499-05-3 Yog ib tug hafide compound ntawm hafnium, ib tug hloov hlau nrog cov tshuaj lom neeg zoo sib xws rau zirconium. HFCL₄ yog siv ua ntej ua ntej ntawm cov tshuaj vapor deposition (CVD) thiab Atomic Txheej Kev Ua Haujlwm (ALD) cov txheej txheem, tshwj xeeb hauv cov khoom siv cov khoom siv science thiab electronics.
Cov ntawv thov ntawmHafnium Tetrachloride 丨 13499-05-3
1. Semiconductor kev lag luam
High-K dielectric Cov Khoom Muaj Txuj Ci
● CVD thiab ALD cov txheej txheem: Hafnium Tetrachloride 丨 13499-05-3 Yog cov yeeb yaj kiab tseem ceeb rau cov microprocess thiab nco cov chips.
● Gate Insulators hauv Cmos Devices: Hfoo₂ txheej hloov cov khoom ua si ntawm Mosfets thiab txhim kho kev ua haujlwm tsis muaj peev xwm ua kom muaj kev sib tw mus rau qhov ntsuas qhov ntsuas.
2. Nuclear cov ntawv thov
Nuclear Reactor Txheej txheem: Hafnium muaj qhov muaj peev xwm tshwj xeeb kom nqus tau neutrons. Hafnium Tetrachloride yog siv nyob rau hauv kev tsim cov kev ua kom siab-purity hafnium hlau, uas yog siv hauv kev tswj pas nrig hauv nuclear reactors.
Houndallic Hafnium Ntau Lawm: HLCC₄ tuaj yeem txo los ntawm magnesium lossis sodium nyob rau hauv cov txheej txheem ntsuas kub (KbollSall Hafnium.
3. Catalyst thiab catalyst prefursor
Lewis acid catalyst: hfcl₄ ua haujlwm raws li muaj zog lewis acid, muaj txiaj ntsig hauv cataleling organic cov tshuaj tiv thaiv xws li friedel-crafts acylation, alkylation, thiab polymerizations.
● Cov khoom siv epentometallic: ua haujlwm raws li pib cov khoom siv rau kev tsim cov organometallic complex, uas yog kev txaus siab rau ob qho tib si kev tshawb fawb thiab caturece polymerization).
4. Tshaj lij Khoom Siv Hluav Taws Xob
● Nanomaterials thiab ceramics: siv los tsim Hafnium-Oxides, thiab carbide cov ntaub ntawv nrog kev kub siab thiab corrosion tsis kam.
● PROUNDSORS rau SUPERHASD COATS: Hauv cov ntaub ntawv tshawb fawb tau muab los ntawm HFCL₄ yog siv los siv cov cuab yeej ultra-ruaj khov rau cov cuab yeej ultra-ruaj khov, thiab turbine hniav.
5. Qhov muag pleev xim
● Hafnium Dioxide (HFO₂), muab tau los ntawm Hfcl₄, yog siv nyob rau hauv high-kev ua haujlwm otecov txheej txheem:
Oantieflected Tsho
Cov Tsom iav Oranar
ouv thiab iR lim
Nws lub siab tshiab tawm suab thiab pob tshab rau hauv cov khoom siv dav dav ua rau nws cov khoom zoo tshaj plaws hauv kev lag luam Optics Optics.
Cov txiaj ntsig ntawmHafnium Tetrachloride 丨 13499-05-3
1. Muaj Siab Purity thiab haum rau cov zaj duab xis tso tawm
● Volatile thiab reactive: HFCL₄ sublimes yooj yim, ua rau nws zoo tagnrho rau vapor-theem cov txheej txheem zoo li Ald \/ CVD, kom muaj kev sib txawv thiab kev ua yeeb yam zoo nkauj.
● Tswjhwm Tso Nyiaj Tso Tawm: Ua kom cov txheej txheem Atomic tswj, tseem ceeb rau Tom ntej-Gev sandiconductor cov cuab yeej thiab nanostructures.
2. Cov khoom siv hluav taws xob zoo tshaj plaws ntawm kev ua haujlwm ntawm derivatives
● Hfoo₂ nyias cov yeeb yaj kiab: Muab cov ntaub ntawv siab tshaj plaws, zoo thermal stability, thiab compatibility nrog silicon, txhim kho microchip kev kawm thiab thiav.
● Cov kav dej qis qis: Pab txo qis zog tau noj hauv cov khoom siv hluav taws xob.
3. Thermal thiab tshuaj ruaj khov
● Hafnium-based cov ntaub ntawv muaj kev ruaj khov zoo heev, ua rau lawv haum rau aerospace, nuclear, thiab kev siv khoom.
4. Versatility hauv Kev Koom Tes Ua Haujlwm
● Ua rau ua ntej ua ntej kev sib koom ua ke rau kev sib koom tes sib koom ua ke, qhib kev tshawb fawb rau catalysts, cov ntaub ntawv tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab, thiab kev tshawb fawb tshiab.
Tag
Hafnium Tetrachloride 丨 {13499-05-3 yog qhov kev ua haujlwm tseem ceeb hauv kev lag luam semiconder, nucleary, thiab khoom siv khoom siv hluav taws xob, thiab cov khoom siv heev synthesis. Nws cov nqi hluav taws xob ua cov txheej txheem hafnium, tshwj xeeb tshaj yog rau cov txheej hafnium hauv cov khoom tseem ceeb hauv cov khoom tseem ceeb hauv cov khoom tseem ceeb hauv niaj hnub no thiab nanotechnology. Nrog rau cov khoom siv cua sov zoo heev thiab tshuaj lom neeg, Hfcl₄ tseem ua tus yuam sij ntawm kev tsim kho tshiab hauv kev ua haujlwm siab, kev cia siab rau cov kev thov muaj kev ntseeg siab.
Cim npe nrov: Hafnium Tetrachloride 丨 cas no 13499-05-3}}}}, Tuam Tshoj Hafnium Tetrachloride 丨 Cas {1}} Cov chaw tsim khoom, cov chaw tsim khoom, Hoobkas
